Magnetron sputtering installations

The magnetron sputtering method allows applying thin-film coatings of almost any material to substrates: metals, semiconductors, and even dielectrics. The use of this method for the synthesis of multilayer X-ray mirrors has become widespread in the world. Mirrors synthesized with the development and improvement of technology have made it possible to achieve significant success in various fields of science and technology, such as solar physics, the study of high-temperature laboratory plasma, projection X-ray lithography, X-ray microscopy, etc.

In our laboratory, this technology is implemented on 7 units. Some of them are equipped with two magnetron sources, some - with four, and some - with six. The sizes of the sputtered targets and vacuum chambers allow applying thin-film coatings to substrates with diameters of up to 350 mm. The uniformity of film thickness over the area, even for substrates with curvature, is tenths of a percent. Samples are loaded on some units through a lock chamber, which significantly saves labor costs and improves the quality of the sputtered structures.

 

Technical specifications

Number of magnetrons, pcs.	2, 4, 6
Maximum substrate size in diameter, mm	350
Surface shape of substrates	Flat, concave or convex. If there is curvature, axial symmetry is desirable
Sprayable materials	Metals, non-metals – semiconductors, dielectrics. Spraying of magnetic materials is possible
Film growth rate, nm/sec	~ 0.1-1.0
Uniformity of coating thickness over the substrate area, %	< 1
Reactive magnetron sputtering	Ar + O2, N2, Kr, Ne, He, Xe
RF spray capability	Yes
Type of substrate holder movement	Circular, linear

Installations equipped with 4 and 6 magnetrons. Allow sputtering of beryllium

Installation equipped with 4 extended magnetrons. Designed for spraying coatings on large-sized substrates

The setup is equipped with 4 magnetrons

This system allows sputtering of targets and polishing of substrates using an ion beam. Samples are loaded through a lock chamber, which is located inside a "clean" box.

Installation equipped with 6 magnetrons

Installation equipped with 4 magnetrons. Designed for deposition of thin-film filters