Наши компетенции
Nikolai I. Chkhalo
Nikolai I. Chkhalo

Research Interests

X-ray optics, surface and thin-film physics, optical interferometry, X-ray sources, projection lithography. Published over 300 papers in peer-reviewed journals.

Education

Faculty of Physics and Engineering, Novosibirsk Electrotechnical Institute, Department of Electrophysical Installations and Accelerators.

Professional Career

  • 1979–1985: Undergraduate studies.

  • 1983–1985: Laboratory assistant, Physical Laboratory, Institute of Nuclear Physics, Siberian Branch of the USSR Academy of Sciences.

  • 1985–2000: Research Trainee, Engineer, Research Scientist, and Senior Research Scientist, Institute of Nuclear Physics, Siberian Branch of the Russian Academy of Sciences (SB RAS).

  • 1996: Ph.D. in Physics and Mathematics (Candidate of Sciences), thesis: "Multilayer X-ray Mirrors for Plasma Diagnostics" (Specialization: 01.04.01 – Experimental Physics Techniques, Instrumentation, and Automation).

  • 2001–2008: Senior Research Scientist, Institute for Physics of Microstructures (IPM RAS).

  • 2008: Acting Head of Laboratory.

  • 2009–present: Head of Laboratory.

  • 2015–present: Head of Department.

  • 2015–2018: Deputy Director for Scientific and Technological Development.

Awards and Honors

  • 2008: A.G. Stoletov Prize for the series "Advances in Multilayer X-ray Optics and Applications in Physical Experiments and Scientific Instrumentation."

  • 2009: D.Sc. in Physics and Mathematics (Doctor of Sciences), thesis: "Methods for Diagnosing Structural and Dispersion Properties of Multilayer X-ray Mirrors" (Specialization: 01.04.01 – Instruments and Methods of Experimental Physics).

  • 2021: Medal "For Contributions to the Implementation of State Policy in Scientific and Technological Development."

Selected Publications

  1. Chkhalo N.I. et al. Status of X-ray mirror optics at the Siberian SR Centre. Nuclear Instruments and Methods in Physics Research A, 359 (1995), 121–126.

  2. Andreev S.S.Chkhalo N.I. et al. Multilayer optics for XUV spectral region: Technology, fabrication, and applications. Central European Journal of Physics, 1 (2003), 191–209.

  3. Chkhalo N.I. et al. A source of a reference spherical wave based on a single-mode optical fiber with a narrowed exit aperture. Rev. Sci. Instrum., 79 (2008), 033107.

  4. Barysheva M.M.Chkhalo N.I. et al. Precision multilayer optics for soft X-ray and EUV ranges. Uspekhi Fizicheskikh Nauk, 182(7) (2012), 727–747.

  5. Chkhalo N.I. et al. High-performance La/B₄C multilayer mirrors with barrier layers for next-generation lithography. Appl. Phys. Lett., 102 (2013), 011602. [DOI:10.1063/1.4774298]

  6. Chkhalo N.I. et al. Roughness measurement and ion-beam polishing of supersmooth optical surfaces of fused quartz and optical ceramics. Opt. Express, 22(17) (2014), 20094–20106.

  7. Svechnikov M.V.Chkhalo N.I. et al. Resolving capacity of the circular Zernike polynomials. Opt. Express, 23(11) (2015), 14677–14694.

  8. Brychikhin M.N.Chkhalo N.I. et al. Reflective Schmidt–Cassegrain system for large-aperture telescopes. Appl. Opt., 55(16) (2016), 4430–4435.

  9. Chkhalo N.I. et al. High-performance facility and techniques for high-precision machining of optical components by ion beams. Precision Engineering, 48 (2017), 338–346. [DOI:10.1016/j.precisioneng.2017.01.004]

  10. Chkhalo N.I. et al. High-reflective Mo/Be/Si multilayers for EUV lithography. Opt. Lett., 42(24) (2017), 5070–5073. [DOI:10.1364/OL.42.005070]

  11. Chkhalo N.I. et al. *A double-stream Xe:He jet plasma emission near 6.7 nm.* Appl. Phys. Lett., 112 (2018), 221101. [DOI:10.1063/1.5016471]

  12. Kozakov A.T.Chkhalo N.I. et al. Size-dependent plasmon effects in periodic W-Si-based mirrors. Appl. Surf. Sci., 566 (2021), 150616. [DOI:10.1016/j.apsusc.2021.150616]

  13. Toropov M.Chkhalo N.I. et al. High-aperture low-coherence interferometer with a diffraction reference wave. Opt. Lett., 47(14) (2022), 3459–3462. [DOI:10.1364/OL.460708]

  14. Shaposhnikov R.A.Chkhalo N.I. et al. *Highly reflective Ru/Sr multilayer mirrors for 9–12 nm wavelengths.* Opt. Lett., 47(17) (2022), 4351–4354. [DOI:10.1364/OL.469260]

  15. Malyshev I.V.Chkhalo N.I. et al. *High-aperture EUV microscope using multilayer mirrors and a 3D reconstruction algorithm.* Opt. Express, 30(26) (2022), 47567–47586. [DOI:10.1364/OE.475032]

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