Vladimir N. Polkovnikov

Education

• 1996–2002: Faculty of Radiophysics, Lobachevsky State University of Nizhny Novgorod.

• December 5, 2013: Defended a Ph.D. thesis (Candidate of Physical and Mathematical Sciences) in 01.04.01 – Instruments and Methods of Experimental Physics.

Research Interests

Multilayer mirrors, X-ray radiation, X-ray lithography, nanostructures, magnetron sputtering.

Professional Career

• 2000–2005: Research Trainee, Institute for Physics of Microstructures (IPM RAS).

• 2005–2014: Junior Research Scientist, IPM RAS.

• 2014–2015: Research Scientist, IPM RAS.

• 2015–2020: Head of Laboratory, IPM RAS.

• 2020–2021: Head of Laboratory & Senior Research Scientist (combined role), IPM RAS.

• 2021–present: Deputy Director for Scientific and Technological Development, IPM RAS.

Hirsch Index: 17 (Web of Science), 18 (Scopus & RSCI).

Selected Publications

1. Chkhalo N.I., Polkovnikov V.N. et al. High-performance La/B₄C multilayer mirrors with barrier layers for next-generation lithography. Appl. Phys. Lett. 102, 011602 (2013).

2. Bogachev S.A., Polkovnikov V.N. et al. Advanced materials for multilayer mirrors for extreme ultraviolet solar astronomy. Appl. Opt. 55(9), 2126–2135 (2016).

3. Chkhalo N.I., Polkovnikov V.N. et al. *Be/Al-based multilayer mirrors with improved reflection and spectral selectivity for solar astronomy above 17 nm.* Thin Solid Films 631, 106–111 (2017).

4. Chkhalo N.I., Polkovnikov V.N. et al. High-reflection Mo/Be/Si multilayers for EUV lithography. Opt. Lett. 42(24), 5070–5073 (2017).

5. Polkovnikov V.N. et al. Deposition of Mo/Si multilayers onto MEMS micromirrors for EUV maskless lithography. J. Vac. Sci. Technol. B 35, 062002 (2017).

6. Nechay A.N., Polkovnikov V.N. et al. Oxidation processes in Mo/Be multilayers. AIP Adv. 8, 075202 (2018).

7. Polkovnikov V.N. et al. *Stable high-reflection Be/Mg multilayer mirrors for solar astronomy at 30.4 nm.* Opt. Lett. 44(2), 263–266 (2019).

8. Kasatikov S.A., Polkovnikov V.N. et al. Interfaces of Mo/Be multilayer mirrors studied by X-ray photoelectron spectroscopy. J. Phys. Chem. C 123(42), 25747–25755 (2019).

9. Chkhalo N.I., Polkovnikov V.N. et al. *Narrowband Si/Al/Sc multilayer mirrors at 58.4 nm.* Opt. Lett. 45(17), 4666–4669 (2020).

10. Polkovnikov V.N. et al. Periodic multilayers for X-ray spectroscopy in the Li K-range. Appl. Sci. 11(14), 6385 (2021).

11. Polkovnikov V.N. et al. *Highly reflective Ru/Y multilayer mirrors for 9–11 nm.* Opt. Express 30(11), 19332–19342 (2022).

12. Shaposhnikov R.A., Polkovnikov V.N. et al. *Ru/Sr multilayer mirrors for 9–12 nm wavelengths.* Opt. Lett. 47(17), 4351–4354 (2022).

Contact Information

• Phone: +7 (831) 417-94-76 (ext. 127)

• Email: polkovnikov@ipmras.ru